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שבוע שעבר, היה לנו העונג לארח אצלנו בפקולטה את הכנס הבינלאומי :"The Atomic Layer Infiltration and Deposition for Functional Hybrid Materials 2023"

Last week, we had the pleasure of hosting The Atomic Layer Infiltration and Deposition for Functional Hybrid Materials 2023 Workshop at our faculty, led by our very own – Associate Professor Tamar Segal-Peretz, who was an integral part of the organizing committee. It was a remarkable four-day event. With 80 participants, 4 tutorials, 30 oral presentations, and 10 posters, it was a hub of scientific exchange and collaboration.

The workshop revolved around atomic layer deposition (ALD) based methods, including ALD, atomic layer infiltration (ALI), sequential infiltration synthesis (SIS), vapor phase infiltration (VPI) and molecular layer deposition (MLD). These methods enable the formation of thin films, with precise control over their thickness and composition, the transformation of polymers and organic materials into hybrid materials, and the fabrication of hybrid organic-inorganic and organic molecular layers. This promising technique contributes to fields spanning from energy storage and water filtration to semiconductor nanofabrication and optical coatings.

The workshop fostered an environment where attendees, students, postdocs, PIs and industry professionals, engaged in fruitful discussions, networking, and new partnerships. The program began with a tutorial on atomic layer deposition (ALD) technologies. Over the next three and a half days, attendees delved into the latest research on ALD, infiltration deposition (SIS, VPI, ALI), and molecular layer deposition (MLD). In addition to the academic program, participants enjoyed social activities, including a cable car ride to the University of Haifa and a tour of old Acre. Good food and good company were never in short supply.

We would like to thank the organizing committee and the generous support of all of the sponsors for making this wonderful event as remarkable as it was.